bokomslag Design for Manufacturability with Advanced Lithography
Data & IT

Design for Manufacturability with Advanced Lithography

Bei Yu David Z Pan

Pocket

739:-

Funktionen begränsas av dina webbläsarinställningar (t.ex. privat läge).

Uppskattad leveranstid 11-22 arbetsdagar

Fri frakt för medlemmar vid köp för minst 249:-

Andra format:

  • 164 sidor
  • 2016
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
  • Författare: Bei Yu, David Z Pan
  • Format: Pocket/Paperback
  • ISBN: 9783319373935
  • Språk: Engelska
  • Antal sidor: 164
  • Utgivningsdatum: 2016-08-23
  • Förlag: Springer International Publishing AG