Developments in Photoelasticity

In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.

Key Features:

• Establishes the basics of photoelasticity with clarity to serve as a primary reference for users of the methodology
• Explains phase-shifting methods that are robust enough to allow the reader to implement them with ease.
• Explores modern methods based on colour information processing using a single isochromatic image as well as use of conventional polariscopes for complete photoelastic analysis.
• Provides carrier fringe analysis tools for quantifying low stress field information for special applications.
• Extensive information on a variety of applications of photoelasticity covering domains ranging from biomedical to aerospace to civil engineering applications.
• Highlights large scale photoelastic studies in granular materials with applications in plant biology, neurobiology and biomimetics