GeSi Strained Layers and Their Applications

This volume presents 49 key papers published in recent years dealing with silicon-germanium strained layers and their applications. The papers have been selected by Professor Suresh Jain of Oxford University, who also provides a brief review of SiGe strained layers technology to place all the papers in an appropriate context. Papers are presented in three groups, dealing with growth and mechanical properties of strained layers, electronic and optical properties, and applications, notably in novel diode and transistor designs, and high performance optical detectors. An important aspect of the selection is the cross-disciplinary nature of the papers, presenting material from electronic engineers as well as from physicists and materials scientists. An extensive bibliography gives details of a further 250 papers on the subject.