Microscopy of Semiconducting Materials, 1991: Proceedings of the Institute of Physics Conference Held at Oxford University, 25-28 March 1991

The volume contains the invited and contributed papers presented at the conference on the Microscopy of Semiconducting Materials which took place at Oxford University on 25-28 March 1991. The event was organized with scientific sponsorship by the Electron Microscopy and Analysis Group of the Institute of Physics, the Royal Microscopical Society and the Materials Research Society. This conference was the seventh in the series which focuses on the most recent developments in the microscopical studies of semiconductors and delegates from 20 countries gave a comprehensive account of work progressing at the current state-of-the-art across the whole field. Advanced electronic materials incorporate ever more complex, high-tolerance structures to yield required electrical and/or optical performance. The microscopy techniques arrayed at this conference represent, in many cases, the only methods available to determine materials characteristics with the necessary precision. For example, high resolution microscopy using any of the transmission, scanning transmission, scanning tunnelling and atom probe techniques now routinely yields atomic-scale structural and compositional information. Small-scale optical and electrical properties can be probed with a variety of advanced scanning techniques and these, together with the very wide range of standard characterization approaches, provide a highly detailed understanding of semiconductor behaviour. The 160 papers presented at this conference cover the broad spectrum of in-depth basic and applied research which relies directly upon the integrated application of microscopy techniques.