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Addresses electromigration failure modes in electronics covering both theory and experiments. Reviews silicon and GaAs technologies. Various rate controlling details are summarized including an investigation of temperature dependence. Concludes with a discussion regarding current status and future plans for electromigration resistant advanced metallization systems for VLSI.
- Format: Inbunden
- ISBN: 9780471584896
- Språk: Engelska
- Antal sidor: 343
- Utgivningsdatum: 1994-02-01
- Förlag: Wiley-Interscience